Model - Based Run - to - Run Uniformity Control for Epitaxial Silicon Deposition ]
نویسندگان
چکیده
This paper analyzes data taken by Gower-Hall for his MIT PhD thesis. In his thesis, Gower-Hall examines run-to-run control of epitaxial film deposition by way of thickness and resistivity measurements of the film deposited. Our main focus is analysis of the resistivity data captured from the experiments. We give an overview of the thesis, confirm Gower-Hall’s findings of the main factors influencing resistivity with basic data analysis, and then extend the analysis of the resistivity measurements.
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